RKVarma AI Universe ✦ R&D Intelligence · company 12 of 50
12 TSMC
AI hardware and software R&D at TSMC, from every daily edition, newest first · Curated by Dr.P.R.K.Varma
Hardware
21 October 2026
TSMC–ASML initiative on 12-inch High-NA EUV photomasks (pilot line targeted 2031); Q3 2026 results
lithography / process
HardwareCompany or official announcementTRL: Theoretical
Evidence: corporate disclosure · TRL: theoretical (roadmap) · Sources: sec.gov · RKV-RND-2026-10-21-018
Full write-up from 21 October 2026
Latest verified R&D update. Date: 2026-10-14. ASML's Q3 2026 presentation (14 October 2026) described a TSMC initiative for 12-inch High-NA EUV photomasks, targeting a pilot line by 2031 and advanced-node production by 2033. Secondary coverage reports that 3 nm reached 33% of TSMC's 3Q26 wafer revenue. Press reports that NVIDIA's NVHBM base dies will move to TSMC 3 nm are unconfirmed by TSMC or NVIDIA. Evidence: corporate disclosure. TRL: theoretical (roadmap). Source(s): https://www.sec.gov/Archives/edgar/data/937966/000162828026065813/a2026_10x14xpresentation.htm